Formation of Carbon Nano-flakes by RF Magnetron Sputtering Method
نویسندگان
چکیده
منابع مشابه
Characterization of PZT Ferroelectric Thin Films by RF-magnetron Sputtering
By using Radio Frequency (RF) magnetron sputtering method, Pb(Zr0.5Ti0.5)O3 (PZT) thin films were deposited on Pt/Ti/ SiO2/Si substrates. Pt/Ti bottom electrode was fabricated on SiO2/Si substrates by magnetron dual-facing-target sputtering system. Phase and crystalline structure analyses of the PZT films were performed on an X-ray diffraction(XRD), Surface morphology, roughness and particle si...
متن کاملNanocrystalline GaN and GaN:H Films Grown by RF-Magnetron Sputtering
The structural and optical properties of nanocrystalline GaN and GaN:H films grown by RF-magnetron sputtering are focused here. The films were grown using a Ga target and a variety of deposition parameters (N2/H2/Arflow rates, RF power, and substrate temperatures). Si (100) and fused silica substrates were used at relatively low temperatures (Ts ≤ 420K). The main effects resulting from the depo...
متن کاملEnhanced of Nano-mechanical Properties of NiTi Alloy by Applied Nanostructured Tantalum Nitride Coating with Magnetron Sputtering method
Nowadays, suitable protective properties of tantalum nitride coatings, such as hardness, abrasion resistance and high corrosion resistance lead to increasing its application in medical engineering and improving the biological behavior of titanium and its alloys. In this research, nanostructured tantalum nitride coating was applied on the NiTi alloy by magnetron sputtering method. Then, the ...
متن کاملDEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
متن کاملSiC formation for a solar cell passivation layer using an RF magnetron co-sputtering system
In this paper, we describe a method of amorphous silicon carbide film formation for a solar cell passivation layer. The film was deposited on p-type silicon (100) and glass substrates by an RF magnetron co-sputtering system using a Si target and a C target at a room-temperature condition. Several different SiC [Si1-xCx] film compositions were achieved by controlling the Si target power with a f...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: SHINKU
سال: 2004
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.47.82